Real-Time Plasma Process Condition Sensing and Abnormal Process Detection
نویسندگان
چکیده
منابع مشابه
Real-Time Plasma Process Condition Sensing and Abnormal Process Detection
The plasma process is often used in the fabrication of semiconductor wafers. However, due to the lack of real-time etching control, this may result in some unacceptable process performances and thus leads to significant waste and lower wafer yield. In order to maximize the product wafer yield, a timely and accurately process fault or abnormal detection in a plasma reactor is needed. Optical emi...
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ژورنال
عنوان ژورنال: Sensors
سال: 2010
ISSN: 1424-8220
DOI: 10.3390/s100605703